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Patent Applications United States Patent and Trademark Office Compliance

Fox Rothschild LLP

New USPTO Continuation Fee: A Hidden Trap for Patent Filers

Fox Rothschild LLP on

The United States Patent and Trademark Office (USPTO) recently introduced a Continuing Application Fee (CAF) to address the growing backlog of continuing applications and encourage timely prosecution. Effective January 19,...more

Knobbe Martens

End of an Era: The After Final Consideration Pilot Program 2.0 Concludes

Knobbe Martens on

The sun is officially setting on the United States Patent and Trademark Office’s (USPTO) After Final Consideration Pilot Program 2.0 (AFCP 2.0)[1].  This program, which has been instrumental in facilitating patent prosecution...more

Foley & Lardner LLP

New IDS Requirement In USPTO Fee-Setting Proposal

Foley & Lardner LLP on

The U.S. Patent and Trademark Office’s (USPTO’s) proposed rulemaking that focuses on “fee adjustments” for 2025 includes a trap for the unwary related to Information Disclosure Statements (IDSs) that could complicate...more

Robinson+Cole Data Privacy + Security Insider

USPTO Issues Guidance on Use of AI Based Tools

The U.S. Patent and Trademark Office (USPTO) issued guidance on the use of AI-based tools to prepare and prosecute patent and trademark applications. This announcement supplements the previous guidance issued in February....more

Wolf, Greenfield & Sacks, P.C.

USPTO Guidance on Use of AI-Based Tools in Practice: How to Mitigate Risk

Use of AI-based tools are permitted, but parties should use caution to ensure compliance with all duties and obligations - Recognizing that AI tools are already being used by parties practicing before the USPTO, this week the...more

McDonnell Boehnen Hulbert & Berghoff LLP

The USPTO's Guidance on Use of AI-based Tools in Practice

Since President Biden issued his Executive Order on the Safe, Secure, and Trustworthy Development and Use of Artificial Intelligence, the U.S. Patent and Trademark Office has been investigating the potential pitfalls of...more

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